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|Title:||The role of cold sonicated development scenarios for achieving ultradense and high aspect ratio for optical metamaterial applications||Authors:||Tjahjana, Liliana
Zhang, Dao Hua
Tobing, Landobasa Yosef Mario A. L.
|Issue Date:||2012||Source:||Tobing, L. Y. M. A. L., Tjahjana, L., & Zhang, D. H. (2012). The role of cold sonicated development scenarios for achieving ultradense and high aspect ratio for optical metamaterial applications. 2012 Photonics Global Conference (PGC).||Abstract:||We present a systematic study of different sonicated cold development scenarios for the purpose of achieving high density optical metamaterial. High aspect ratio sub-15-nm dots at pitch as small as 40 nm are successfully demonstrated for 110-nm thick resist at low exposure dose. Some of the key results include sub-15-nm gold nanodots at 40-nm pitch and high density optical metamaterial (with only ~30nm separation between two adjacent resonators).||URI:||https://hdl.handle.net/10356/97976
|DOI:||10.1109/PGC.2012.6458017||Rights:||© 2012 IEEE.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||EEE Conference Papers|
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