Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/98646
Title: Thermal oxidation of Ni films for p-type thin-film transistors
Authors: Wang, Xinghui
Zhang, Qing
Jiang, Jie
Li, Jingqi
Zhang, X. X.
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Issue Date: 2013
Source: Jiang, J., Wang, X., Zhang, Q., Li, J., & Zhang, X. X. (2013). Thermal oxidation of Ni films for p-type thin-film transistors. Physical chemistry chemical physics, 15(18), 6875-6878.
Series/Report no.: Physical chemistry chemical physics
Abstract: p-Type nanocrystal NiO-based thin-film transistors (TFTs) are fabricated by simply oxidizing thin Ni films at temperatures as low as 400 °C. The highest field-effect mobility in a linear region and the current on–off ratio are found to be 5.2 cm2 V−1 s−1 and 2.2 × 103, respectively. X-ray diffraction, transmission electron microscopy and electrical performances of the TFTs with “top contact” and “bottom contact” channels suggest that the upper parts of the Ni films are clearly oxidized. In contrast, the lower parts in contact with the gate dielectric are partially oxidized to form a quasi-discontinuous Ni layer, which does not fully shield the gate electric field, but still conduct the source and drain current. This simple method for producing p-type TFTs may be promising for the next-generation oxide-based electronic applications.
URI: https://hdl.handle.net/10356/98646
http://hdl.handle.net/10220/17456
DOI: 10.1039/c3cp50197c
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:EEE Journal Articles

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