Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/98842
Title: GaN-on-Silicon integration technology
Authors: Ng, Geok Ing
Arulkumaran, Subramaniam
Vicknesh, Sahmuganathan
Wang, H.
Ang, K. S.
Kumar, C. M. Manoj
Ranjan, K.
Lo, Guo-Qiang
Tripathy, Sudhiranjan
Boon, Chirn Chye
Lim, Wei Meng
Issue Date: 2012
Abstract: This work presents our recent progress on addressing two major challenges to realizing GaN-Silicon integration namely epitaxial growth of GaN-on-Silicon and CMOS-compatible process. We have successfully demonstrated 0.3-μm gate-length GaN HEMTs on 8-inch Si(111) substrate with fT of 28GHz and fmax of of 64GHz. These device performances are comparable to our reported devices fabricated on 4-inch Si substrate. We have also developed a GaN HEMT process with CMOS-compatible non-gold metal scheme. Excellent ohmic contacts (Rc=0.24 Ω-mm) with smooth surface morphology have been achieved which are comparable to those using conventional III-V gold-based ohmic contacts. 0.15-μm gate-length GaN HEMTs fabricated with this process achieved fT and fmax of 51 GHz and 50GHz respectively. The 5nm-thick AlGaN barrier HEMT exhibited three terminal OFF-state breakdown voltage (BVgd) of 83 V. Our results demonstrate the feasibility of realizing CMOS-compatible high performance GaN HEMTs on 8-inch silicon substrates for future GaN-on-Si integration.
URI: https://hdl.handle.net/10356/98842
http://hdl.handle.net/10220/12826
DOI: 10.1109/RFIT.2012.6401646
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:EEE Conference Papers

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