Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/98855
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dc.contributor.authorHuang, Leien
dc.contributor.authorAsundi, Anand Krishnaen
dc.date.accessioned2013-08-01T01:48:05Zen
dc.date.accessioned2019-12-06T20:00:27Z-
dc.date.available2013-08-01T01:48:05Zen
dc.date.available2019-12-06T20:00:27Z-
dc.date.copyright2012en
dc.date.issued2012en
dc.identifier.citationHuang, L., & Asundi, A. K. (2012). Improvement of least squares integration method with iterative compensation for shape reconstruction from gradient. Proceedings of SPIE - Optical Micro- and Nanometrology IV, 84300S.en
dc.identifier.urihttps://hdl.handle.net/10356/98855-
dc.description.abstractAn improvement is made to the traditional 2D integration with least squares method by introducing an iterative compensation procedure. The issue of inaccurate reconstruction due to imperfection of Southwell grid model is solved through the introduced iterative compensations. The feasibility and superiority of the proposed method are investigated with simulations. Moreover, the proposed method is compared with the integration method with radial basis functions.en
dc.language.isoenen
dc.rights© 2012 SPIE. This paper was published in Proceedings of SPIE - Optical Micro- and Nanometrology IV and is made available as an electronic reprint (preprint) with permission of SPIE. The paper can be found at the following official DOI: [http://dx.doi.org/10.1117/12.921402]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.en
dc.titleImprovement of least squares integration method with iterative compensation for shape reconstruction from gradienten
dc.typeConference Paperen
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen
dc.contributor.conferenceOptical Micro- and Nanometrology (4th : 2012 : Brussels, Belgium)en
dc.identifier.doi10.1117/12.921402en
dc.description.versionPublished versionen
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item.grantfulltextopen-
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