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Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol
The etch resist ability of dip-pen nanolithography (DPN)-generated dot patterns of different alkanethiols on Au was systematically studied. After 16-mercaptohexadecanioc acid (MHA) and 1-octadecanethiol (ODT) dots with ...
Controlled growth of peptide nanoarrays on Si/SiOx substrates
PAMAM dendrimer nanopatterns on Si/ SiOx substrates generated by dip-pen nanolithography are used as anchoring scaffolds for the growth of peptides in situ by ring-opening polymerization of tryptophan-N-carboxyanhydrides. ...