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Dip pen nanolithography stamp tip
A simple and novel method for fabricating poly(dimethylsiloxane) (PDMS)-coated dip pen nanolithography (DPN) stamp tips was developed. These kinds of tips absorb chemicals (“inks”) easily and allow one to generate ...
High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
Si nanostructures: A new method for fabricating large-area Si nanostructures in a high-throughput fashion has been demonstrated. The procedure is based upon dip-pen nanolithography in combination with wet-chemical etching ...
Dip pen nanolithography and its potential for nanoelectronics
Dip pen nanolithography (DPN) is a patterning technique for nanoscale science and engineering based on scanning probe microscopy. Its main advantages are very high resolution, the unique capability to deposit many different ...
Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching
A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on ...